Technical features
- Microlab is a multi-functional direct writing lithography system designed for basic research. It is equipped with a long-life 405 nm light source that enables the fabrication of almost any desired micro-structures on various near-ultraviolet photoresists. Applications include experimental masks, microfluidic chips, electrodes for two-dimensional materials, micro-optics, MEMS, etc. It provides an optional 355 nm ultraviolet light source for special photoresist processes such as SU-8, and an optional phase interference module and polarization modulation module for the research and fabrication of diffractive optical devices.
- Microlab supports a writing area of 4-6 inches and is capable of handling small substrates with a minimum size of 5 mm. It supports file formats such as GDSII, STL, and BMP for the fabrication of 2D and 3D morphological micro-structures. It provides the capability to merge multiple files to create photolithography tasks and can complete the process unattended in one go. With a variety of lithography modes such as scanning, stepping, and fixed-point writing, it can provide customized solutions for the research and development of special devices.
Specifications
* The metrics may vary depending on the processes
Example applications
