Technical features

• The MiScan direct writing lithography system has efficient writing performance and is a multi-purpose patterning lithography system designed for the development and small-volume production and application of devices. It is equipped with a high-power fiber laser or an ultraviolet 355 nm pulse laser, and allows for high-quality fabrication of high-resolution micro-/nanostructures when using with an amplitude-phase joint modulation pattern generator and a high-precision motion control system.

• The writing area of the standard model is up to 8-10 inches, which caters to applications such as optical devices, advanced packaging, and conventional masks. We provide customized equipment with a writing area from 400 mm to 600 mm for the fabrication of large-area micro/nano patterns, such as micro-nano optical materials, panel-level format packaging research, etc.
• It supports common 2D and 3D industrial data formats such as GDSII and STL to meet the needs of conventional multi-purpose lithography, and provides optional data processing servers to meet the needs of large-volume data writing and customized data processing. It can be customized with partition alignment and multi-chip array functions for small batch customized production.

Specifications

* The metrics may vary depending on the processes

Example applications